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Other Systems

We supply etching systems for difficult to etch materials such as SiC and LiNbO3. These materials are commonly used in high-temperature MEMS and next-generation power devices; materials for optical waveguide devices; and photonic devices such as modulators and Light Emitting Diodes.

We also provide plasma deposition equipment suitable for forming low-stress silicon nitride films or thick silicon oxide films for optical waveguides.

photo:Other Systems