Other Systems
We supply etching systems for difficult to etch materials such as SiC and LiNbO3. These materials are commonly used in high-temperature MEMS and next-generation power devices; materials for optical waveguide devices; and photonic devices such as modulators and Light Emitting Diodes.
We also provide plasma deposition equipment suitable for forming low-stress silicon nitride films or thick silicon oxide films for optical waveguides.
