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NEWS

2026/4/30

MEMS Infinity Strengthens Microfabrication Capabilities with New Photolithography Equipment

Expanding Foundry Capabilities from Prototyping to Volume Production — Enabling Finer, Higher-Precision, and More Diverse MEMS Device Manufacturing


Canon FPA-3030i5a (left) and TEL Clean Track ACT-8Z (right) installed in the MEMS Infinity cleanroom

Canon FPA-3030i5a (left) and TEL Clean Track ACT-8Z (right) installed in the MEMS Infinity cleanroom


AMAGASAKI, HYOGO, JAPAN – [April 24, 2026 ] – MEMS Infinity, the MEMS foundry division of Sumitomo Precision Products Co., Ltd. has installed a Canon FPA-3030i5a i-line stepper and a TEL Clean Track ACT-8Z high-precision coater/developer, significantly enhancing its photolithography process capabilities.


MEMS Infinity provides end-to-end foundry services — from development through volume production — for a wide range of MEMS devices, including sensors and actuators, with deep reactive ion etching (Deep-RIE) of silicon as its core technology. The division already operates a dedicated silicon etching system, the Predeus, providing a prototyping environment that can flexibly accommodate customer development timelines.
With the addition of these photolithography systems, MEMS Infinity is now positioned to fully leverage the potential of its deep silicon etching expertise.


1. Equipment Highlights
Both systems are compatible with 6-inch and 8-inch wafers, providing the flexibility to support customers across development phases — from small-lot prototyping to volume production.


■MEMS i-line Stepper: Canon FPA-3030i5a
The Canon FPA-3030i5a i-line stepper delivers fine patterning at a minimum L/S resolution of 0.35 μm and is equipped with Si-transparent backside alignment capability. Since MEMS devices frequently require dual-sided processing, this feature enables significantly improved alignment accuracy for front-to-back patterning. The system also supports transparent substrates such as glass and quartz, enabling fabrication of devices for growing markets including microfluidic chips and optical MEMS.


■High-Precision Coater/Developer: TEL Clean Track ACT-8Z
The TEL Clean Track ACT-8Z high-precision coater/developer achieves coating uniformity within ±0.5% across 50-wafer lots. Resist film uniformity is a critical factor directly affecting etch process accuracy and production yield — variations in film thickness can lead to over-etching in thinner areas, impacting device performance. The system accommodates resist viscosities ranging from 1 cp to 150 cp, enabling flexible coating from thin to thick films. The ability to apply thick resist films allows the formation of etch masks capable of withstanding deeper silicon etching, making it possible to fabricate complex three-dimensional structures with high aspect ratios.


2. Value for Customers
Tsuyoshi Takemoto, General Manager of MEMS Infinity commented: "MEMS Infinity has built its foundry services around deep silicon etching technology, helping customers turn their ideas into reality.
With the introduction of this new photolithography equipment, we have dramatically improved both the precision and versatility of our microfabrication processes, enabling us to produce MEMS devices with complex structures that were previously difficult to achieve. We will continue to strengthen our integrated manufacturing environment — from prototyping to volume production — and serve as a trusted partner in accelerating our customers' innovation."


■About MEMS Infinity
MEMS Infinity is a dedicated foundry division specializing in the development and volume production of MEMS sensors and actuators for a wide range of industries. Located in Amagasaki, Hyogo Prefecture, the facility features 31,300 square feet (approx. 2,910 m²) of cleanroom space equipped with 150 mm and 200 mm wafer-compatible fab tools, offering processes that include high-performance PZT thin-film deposition and silicon DRIE. Building on more than 30 years of MEMS manufacturing expertise within the Sumitomo Precision Products group, MEMS Infinity delivers high-quality, environmentally responsible manufacturing backed by ISO 9001 certification.


■About Sumitomo Precision Products Co., Ltd.
Founded in 1961 (Head Office: 1-10 Fuso-cho, Amagasaki, Hyogo; President and CEO: Tetsuya Tsurumaru), Sumitomo Precision Products Co., Ltd. began its operations based on precision machining technologies and expertise in high-strength metal materials cultivated through aircraft equipment manufacturing. Today, the company provides comprehensive services from product design through manufacturing across its Aerospace, Industrial Equipment, and ICT business divisions. The ICT Division offers MEMS device foundry services and develops and manufactures semiconductor and MEMS manufacturing equipment, including deep silicon etching systems, as well as ozone generation systems for semiconductor applications. Through technological innovation, Sumitomo Precision Products is committed to contributing to a sustainable society.


【Related Links】
MEMS Infinity Website: https://www.spp.co.jp/infinity/
Sumitomo Precision Products Corporate Website: https://www.spp.co.jp/


【Contact Information】
Sumitomo Precision Products Co., Ltd. 1-10 Fuso-cho, Amagasaki, Hyogo 660-0891, Japan
Phone: +81-(0)6-6482-8811


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